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dc.contributor.authorVillamayor, Antía
dc.contributor.authorAlba, Alonso
dc.contributor.authorBarrio Cagigal, Victoria Laura ORCID
dc.contributor.authorRojas Muñoz, Sergio
dc.contributor.authorGutiérrez Berasategui, Eva
dc.date.accessioned2024-07-30T10:55:23Z
dc.date.available2024-07-30T10:55:23Z
dc.date.issued2024-07-11
dc.identifier.citationCoatings 14(7) : (2024) // Article ID 868es_ES
dc.identifier.issn2079-6412
dc.identifier.urihttp://hdl.handle.net/10810/69088
dc.description.abstractThe development of cost-effective components for Proton Exchange Membrane (PEM) electrolyzers plays a crucial role in the transformation of renewable energy into hydrogen. To achieve this goal, two main issues should be addressed: reducing the Platinum Group Metal (PGM) content present on the electrodes and finding a large-scale electrode manufacturing method. Magnetron sputtering could solve these hurdles since it allows the production of highly pure thin films in a single-step process and is a well-established industrial and automated technique for thin film deposition. In this work, we have developed an ultra-low 0.1 mg cm−2 Pt loading electrode using magnetron sputtering gas aggregation method (MSGA), directly depositing the Pt nanoparticles on top of the carbon substrate, followed by a complete evaluation of the electrochemical properties of the sputtered electrode. These ultra-low Pt content electrodes have been thoroughly characterized and tested in a real electrolyzer cell. They demonstrate similar efficiency to commercial electrodes with a Pt content of 0.3 mg/cm2, achieving a 67% reduction in Pt loading. Additionally, durability tests indicate that these electrodes offer greater stability compared to their commercial counterparts. Thus, magnetron sputtering has been proven as a promising technology for manufacturing optimum high-performance electrodes at an industrial scale.es_ES
dc.description.sponsorshipThis work was supported by the H2PLAN project funded by MCIN and Basque Government with funding from European Union NextGenerationEU (PRTR-C17.I1). Spanish grants PID2020-116712RB-C21 and TED2021-131033B–I00 from MCIN/AEI/10.13039/501100011033 are also acknowledged.es_ES
dc.language.isoenges_ES
dc.publisherMDPIes_ES
dc.relationinfo:eu-repo/grantAgreement/MICINN/PID2020-116712RB-C21es_ES
dc.relationinfo:eu-repo/grantAgreement/MICINN/TED2021-131033B–100es_ES
dc.rightsinfo:eu-repo/semantics/openAccesses_ES
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/es/
dc.subjectmagnetron sputteringes_ES
dc.subjecthydrogen evolution reactiones_ES
dc.subjectlow Pt loadinges_ES
dc.titleMagnetron Sputtered Low-Platinum Loading Electrode as HER Catalyst for PEM Electrolysises_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.date.updated2024-07-26T12:29:37Z
dc.rights.holder© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/ 4.0/).es_ES
dc.relation.publisherversionhttps://www.mdpi.com/2079-6412/14/7/868es_ES
dc.identifier.doi10.3390/coatings14070868
dc.departamentoesIngeniería química y del medio ambiente
dc.departamentoeuIngeniaritza kimikoa eta ingurumenaren ingeniaritza


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© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/ 4.0/).
Except where otherwise noted, this item's license is described as © 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/ 4.0/).