Show simple item record

Exploring the Self-Assembly Capabilities of ABA-Type SBS, SIS, and Their Analogous Hydrogenated Copolymers onto Different Nanostructures Using Atomic Force Microscopy

dc.contributor.authorPolitakos, Nikolaos
dc.contributor.authorKortaberria Altzerreka, Galder ORCID
dc.date.accessioned2019-01-11T12:55:57Z
dc.date.available2019-01-11T12:55:57Z
dc.date.issued2018-09
dc.identifier.citationMaterials 11(9) : (2018) // Article ID 1529es_ES
dc.identifier.issn1996-1944
dc.identifier.urihttp://hdl.handle.net/10810/30756
dc.description.abstractIn this work, the self-assembled morphologies obtained for poly(styrene-b-butadiene-b-styrene) (SBS) and poly(styrene-b-isoprene-b-styrene) (SIS) ABA-type copolymers were investigated before and after hydrogenation of the polydiene block, which led to poly(styrene-b-ethylene)/poly(ethylene-b-styrene) (SEES) and poly(styrene-b-ethylene)/poly(propylene-b-styrene) (SEPS) copolymers, respectively. The evaluation of different morphologies was carried out using atomic force microscopy (AFM), analyzing the effect of various parameters such as the solvent and polymer concentrations employed for film casting (toluene, cyclohexane, or tetrahydrofurane with concentrations of 1 and 3 wt%), together with that of the annealing treatment (thermal annealing at room temperature, and 60, 80, and 100 degrees C). The effect of these parameters in combination with the chemical nature of the polydiene block led to different morphologies with different topographic aspects affecting the roughness (Ra) of the film.es_ES
dc.description.sponsorshipFinancial support from the Basque Country Government (Grupos Consolidados, IT776-13) and the Spanish Ministry of Economy and Competitiveness and European Community in the frame of MAT2015-66149-P project is gratefully acknowledged.es_ES
dc.language.isoenges_ES
dc.publisherMDPIes_ES
dc.relationinfo:eu-repo/grantAgreement/MINECO/MAT2015-66149-Pes_ES
dc.rightsinfo:eu-repo/semantics/openAccesses_ES
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/es/*
dc.subjectblock copolymerses_ES
dc.subjectatomic force microscopy (AFM)es_ES
dc.subjectpolymer morphologyes_ES
dc.subjectpolymer nanostructureses_ES
dc.subjectself-assemblyes_ES
dc.subjectpolymer characterizationes_ES
dc.subjecthydrogenated copolymerses_ES
dc.subjectblock-copolymerses_ES
dc.subjectdiblock copolymeres_ES
dc.subjecttriblock copolymeres_ES
dc.subjectthin-filmses_ES
dc.subjectmolecular-weightes_ES
dc.subjecthydrophobic propertieses_ES
dc.subjectnanoporous membraneses_ES
dc.subjectphase-transitiones_ES
dc.subjectdrug-deliveryes_ES
dc.subjectsolvent vapores_ES
dc.titleExploring the Self-Assembly Capabilities of ABA-Type SBS, SIS, and Their Analogous Hydrogenated Copolymers onto Different Nanostructures Using Atomic Force Microscopyes_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.rights.holderThis is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).es_ES
dc.rights.holderAtribución 3.0 España*
dc.relation.publisherversionhttps://www.mdpi.com/1996-1944/11/9/1529es_ES
dc.identifier.doi10.3390/ma11091529
dc.departamentoesIngeniería química y del medio ambientees_ES
dc.departamentoesQuímica aplicadaes_ES
dc.departamentoeuIngeniaritza kimikoa eta ingurumenaren ingeniaritzaes_ES
dc.departamentoeuKimika aplikatuaes_ES


Files in this item

Thumbnail
Name:
materials-11-01529-v2.pdf
Size:
6.644Mb
Format:
PDF
Description:
Artículo principal
View/Open
Thumbnail
Name:
license_rdf
Size:
914bytes
Format:
application/rdf+xml
View/Open

This item appears in the following Collection(s)

Show simple item record

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
Except where otherwise noted, this item's license is described as This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).