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dc.contributor.authorZhukova Zhukova, Valentina ORCID
dc.contributor.authorCorte León, Paula ORCID
dc.contributor.authorTalaat, Ahmed
dc.contributor.authorIpatov, Mihail
dc.contributor.authorGarcía Gómez, Alfonso
dc.contributor.authorGonzález, Alvaro
dc.contributor.authorBlanco Aranguren, Juan María ORCID
dc.contributor.authorZukov Egorova, Arkady Pavlovich
dc.date.accessioned2024-04-09T16:29:49Z
dc.date.available2024-04-09T16:29:49Z
dc.date.issued2024-03-12
dc.identifier.citationProcesses 12(3) : (2024) // Article ID 556es_ES
dc.identifier.issn2227-9717
dc.identifier.urihttp://hdl.handle.net/10810/66575
dc.description.abstractMagnetic microwires with amorphous structures can present a unique combination of excellent magnetic softness and giant magnetoimpedance (GMI) effects together with reduced dimensions and good mechanical properties. Such unique properties make them suitable for various technological applications. The high GMI effect, observed in as-prepared Co-rich microwires, can be further optimized by postprocessing. However, unexpected magnetic hardening and a transformation of the linear hysteresis loop into a rectangular loop with a coercivity on the order of 90 A/m were observed in several Co-rich microwires upon conventional annealing. Several routes to improve magnetic softness and GMI effect in Fe- and Co-rich magnetic microwires are provided. We observed that stress annealing could remarkably improve the magnetic softness and GMI ratio of Co-rich microwires. Thus, almost unhysteretic loops with a coercivity of 2 A/m and a magnetic anisotropy field of about 70 A/m are achieved in Co-rich microwires stress annealed at appropriate conditions. The observed change in hysteresis loops and the GMI effect is explained by stress-annealing-induced anisotropy, which is affected by the stresses applied during annealing and by the annealing temperature. While as-prepared Fe-rich amorphous microwires present a low GMI effect, appropriate postprocessing (annealing and stress annealing) allows for a remarkable GMI ratio improvement (an order of magnitude). The evaluated dependence of the maximum GMI ratio on frequency allows the identification of the optimal frequency band for the studied samples. The origin of stress-annealing-induced anisotropy and related changes in hysteresis loops and the GMI effect are discussed in terms of the relaxation of internal stresses, “back-stresses”, as well as structural anisotropy.es_ES
dc.description.sponsorshipThis work was supported by the EU under the “INFINITE” (HORIZON-CL5-2021-D5-01-06) and “Harmony” (HORIZON-CL4-2023-RESILIENCE-01) projects, by the Spanish MICIN under the PID2022-141373NB-I00 project, and by the Government of the Basque Country under the Elkartek (MINERVA, MAGAF, and MOSINCO) projects and under the scheme of “Ayuda a Grupos Consolidados” (Ref. IT1670-22).es_ES
dc.language.isoenges_ES
dc.publisherMDPIes_ES
dc.relationinfo:eu-repo/grantAgreement/MICINN/PID2022-141373NB-I00es_ES
dc.rightsinfo:eu-repo/semantics/openAccesses_ES
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/es/
dc.subjectmagnetic microwireses_ES
dc.subjectmagnetic anisotropyes_ES
dc.subjectmagnetoimpedance effectes_ES
dc.subjecthysteresis loopses_ES
dc.subjectinternal stresseses_ES
dc.subjectinduced magnetic anisotropyes_ES
dc.titleOptimization of Giant Magnetoimpedance Effect of Amorphous Microwires by Postprocessinges_ES
dc.typeinfo:eu-repo/semantics/articlees_ES
dc.date.updated2024-03-27T13:16:21Z
dc.rights.holder© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/ 4.0/).es_ES
dc.relation.publisherversionhttps://www.mdpi.com/2227-9717/12/3/556es_ES
dc.identifier.doi10.3390/pr12030556
dc.departamentoesFísica aplicada I
dc.departamentoesPolímeros y Materiales Avanzados: Física, Química y Tecnología
dc.departamentoeuPolimero eta Material Aurreratuak: Fisika, Kimika eta Teknologia
dc.departamentoeuFisika aplikatua I


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© 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/ 4.0/).
Except where otherwise noted, this item's license is described as © 2024 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/ 4.0/).